In this era of rapid digital development, our lives are inseparable from electronic devices everywhere. From smartphones to computers, from televisions to various smart wearable devices, the manufacturing of core components of these electronic products, such as chips and display screens, all rely on a key material - photoresist.

Photoresist, by definition, is a light-sensitive mixed liquid. It is mainly composed of resins, sensitizers, solvents, and other additives. In the lithography process, the photoresist is uniformly coated on substrate materials such as silicon wafers, and then specific areas of the photoresist undergo chemical reactions through exposure equipment. During the development process, exposed or unexposed photoresist is selectively removed, thereby forming the desired pattern on the substrate, providing an accurate template for subsequent processes such as etching and ion implantation, and ultimately constructing complex and tiny electronic circuit structures.

As the key raw materials of the electronics industry, the demand and quality requirements for electronic chemicals are constantly rising. The raw materials of photoresist are precisely synthesized through Nutsche filter reactor to produce products with extremely low impurity content, ensuring the performance of semiconductor chips. Thus, Nutsche filter reactor have an irreplaceable important position and wide application prospects in the production of electronic chemicals.

 Nutsche filter reactor can precisely control the temperature, providing an appropriate thermal environment for the synthesis reactions of each component of the photoresist. During the polymerization reaction of the resin, the precise temperature setting can ensure that the polymerization reaction proceeds at the expected rate and direction, precisely controlling the length and structure of the resin molecular chain, thereby endowing the photoresist with key properties such as appropriate viscosity, hardness, and corrosion resistance. Its good sealing property also ensures the purity of the reaction system, avoiding the adverse effects of external impurities on the quality of the photoresist. The efficient stirring function allows various raw materials to be fully and uniformly mixed in the reaction kettle, making the reactions between each component more complete and uniform, and improving the conversion rate of the reaction and the consistency of the product. In the binding reaction of the sensitizer and the resin, the efficient mixing through the stirring paddle enables the two to fully contact and undergo a chemical reaction, forming a complex with good photosensitive properties, allowing the photoresist to accurately respond to the action of light during the exposure process and achieve high-precision pattern transfer.

       In emerging fields such as flexible electronics and photoelectric displays, Nutsche filter reactor provide reliable material synthesis solutions for these fields, promoting the rapid development of related industries. It enables the research and development and production of more new types of electronic chemicals, meeting the emerging new demands of the electronics industry and enhancing the competitiveness of the entire electronic chemicals industry in the international market.